| HOME@>@Product Information@>@Oxygen gas controller@>@H2O/O2 Free gas purifier | |||
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| @>>Oxygen partial pressure controller | |||
| @>>Oxygen & Atmosphere control  @@examination furnace  | 
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| @>>H2O/O2 Free gas purifier | |||
| @>>Wet oxygen controller | |||
| @@@ Analysis system | |||
| @@@ A scientific-experiments device @@@ design and manufacture | |||
| @@@ Automatic control and @@@ counting system  | 
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| @@@ Microchamber | |||
| @@@Product outline | |||
@Water and oxygen free gas purification device (SiWOF-2000) are the new type gas purifiers adapting an oxygen ion conductor. Although continuation operation was difficult for moisture removal device, such as the conventional drier system, a cold lap system, and a filter system, since there is no restriction in the amount of dehumidification, and the amount of deoxidization theoretically, with this device, continuation operation of a long period of time (about one year) is possible.  | 
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@@@Feature and Function   | 
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| EOxygen free (less than 1~10E-20atmO2) low dew point (less than DP-90Ž) refining gas can be supplied continuously for a long period of time. ERefining of inactive gas hydrogen gas (N2, Ar, etc.) can ce performed. ELong-term continuation operation is possible.  | 
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| @@@System | |||
@The electric moisture decomposition removing method using an oxygen ion conductor (Yttria Stabilized Zirconia) and an oxygen removal function are used.  | 
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| @@@Specifications and Performance | |||
| Processing gas mass flow | 2.0‚r‚k‚li0.2‚3/‚ˆj | ||
| Processing gas loss | Inactive gas (helium,Ar,N2) and hydrogen gas  | 
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| Processing gas pressure | 0 ` 100kPaigage pressurej | ||
| Supply gas purity | An equivalent for the gas for industry (Less than 10ppmvH2O and O2) | ||
| Refining gas purity | H2OcLess than 100ppb‚–iDP|90Žj O2cLess than 1~10E-20atm  | 
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| Size | W270~D250~H1200 | ||
| Weight | About 35kg | ||
| Power supply | AC100V/1.5‚‹VA | ||
| Installation | Wall tapestry type (it is mount preparation with an exclusive caster at an option)  | 
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