| HOME�@>�@Product Information�@>�@Oxygen gas controller�@>�@H2O/O2 Free gas purifier | |||
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�@�@�@ Oxygen gas control device�@ |
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| �@>>Oxygen partial pressure controller | |||
| �@>>Oxygen & Atmosphere control �@�@examination furnace |
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| �@>>H2O/O2 Free gas purifier | |||
| �@>>Wet oxygen controller | |||
| �@�@�@ Analysis system | |||
| �@�@�@ A scientific-experiments device �@�@�@ design and manufacture | |||
| �@�@�@ Automatic control and �@�@�@ counting system |
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| �@�@�@ Microchamber | |||
| �@�@�@Product outline | |||
�@Water and oxygen free gas purification device (SiWOF-2000) are the new type gas purifiers adapting an oxygen ion conductor. Although continuation operation was difficult for moisture removal device, such as the conventional drier system, a cold lap system, and a filter system, since there is no restriction in the amount of dehumidification, and the amount of deoxidization theoretically, with this device, continuation operation of a long period of time (about one year) is possible. |
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�@�@�@Feature and Function |
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| �EOxygen free (less than 1�~10E-20atmO2) low dew point (less than DP-90�Ž) refining gas can be supplied continuously for a long period of time. �ERefining of inactive gas hydrogen gas (N2, Ar, etc.) can ce performed. �ELong-term continuation operation is possible. |
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| �@�@�@System | |||
�@The electric moisture decomposition removing method using an oxygen ion conductor (Yttria Stabilized Zirconia) and an oxygen removal function are used. |
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| �@�@�@Specifications and Performance | |||
| Processing gas mass flow | 2.0‚r‚k‚l�i0.2‚�3/‚ˆ�j | ||
| Processing gas loss | Inactive gas (helium,Ar,N2) and hydrogen gas |
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| Processing gas pressure | 0 �` 100kPa�igage pressure�j | ||
| Supply gas purity | An equivalent for the gas for industry (Less than 10ppmvH2O and O2) | ||
| Refining gas purity | H2O�cLess than 100ppb‚–�iDP�|90�Ž�j O2�cLess than 1�~10E-20atm |
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| Size | W270�~D250�~H1200 | ||
| Weight | About 35kg | ||
| Power supply | AC100V/1.5‚‹VA | ||
| Installation | Wall tapestry type (it is mount preparation with an exclusive caster at an option) |
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