| HOME�@>�@Product Information�@>�@Oxygen gas controller�@>�@Wet oxygen controller | |||
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�@�@�@ Oxygen gas control device |
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| �@>>Oxygen partial pressure controller | |||
| �@>>Oxygen & Atmosphere control �@�@examination furnace |
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| �@>>H2O/O2 Free gas purifier | |||
| �@>>Wet oxygen controller | |||
| �@�@�@ Analysis system | |||
| �@�@�@ A scientific-experiments device �@�@�@ design and manufacture | |||
| �@�@�@ Automatic control and �@�@�@ counting system |
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| �@�@�@ Microchamber | |||
| �@�@�@Product outline | |||
�@This device adds hydrogen (H2) and vapor (H2O) of arbitrary concentration to examination atmosphere gas (Ar etc.), adjusts oxygen partial pressure with a balanced reaction, and measures it with a zirconia type oxygen sensor. With this device, oxygen-partial-pressure adjustment of quick examination admosphere gas is possible, and it can measure to ultra low oxygen concentration (1-10E-30atm02) with an attached oxygen sensor (SiOC-200C). |
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�@�@�@Feature and Function |
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�@�EIt is ultra low oxygen environment (to 10E-30atmO2) adjustment equipment by H2 / O2 balance gas. |
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| �@�@�@System | |||
�@The Oxygen partial pressure in examination atmosphere gas (argon, nitrogen, etc.) become settled by the following formula / hydrogen concentration and vapor concentration, and the thermodynamic equilibrium constant Kp at the temperature. This oxygen partial pressure can be checked with an attached quantity sensitivity oxygen sensor. |
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| �@�@�@Specifications and Performance | |||
| Oxygen partial pressure control range | ‚d-20 - ‚d-30atmO2 | ||
| Gas used | ‚O - ‚S�“‚g2�^‚`‚’ | ||
| Humidifier | Diffusion formula | ||
| Humidification moisture concentration | less than 100ppmv - more than 2000ppmv | ||
| Examination atmosphere gas flow | ‚T‚O - ‚T‚O‚OSCCM | ||
| High sensitivity oxygen sensor | measurement range : 1-1X10E-30atmO2 |
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| Main part size | ‚v‚T‚O‚O‚˜‚c‚U‚O‚O‚˜‚g‚P‚V‚O‚O | ||
| Power supply | ‚`‚b‚P‚O‚O‚u�^‚R‚‹‚u‚` | ||
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